Classification of The Three PVD Coating Processes Physical Vapor Deposition (PVD) technology refers to the use of physical methods under vacuum conditions to vaporise the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionised into ions, and to deposit a thin film with a particular function on the surface of a substrate through a low pressure gas (or plasma) process, Physical Vapor Deposition is One of the main surface treatment techniques. PVD (Physical Vapour Deposition) coating technology is divided into three main categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. The main methods of physical vapour deposition are: vacuum evaporation coating, sputtering coating, arc plasma coating, ion coating and molecular beam epitaxy. The corresponding vacuum coating equipment includes vacuum evaporation coaters, vacuum sputtering coaters and vacuum ion coaters.
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