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PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two major thin-film coating technologies. PVD vaporizes materials through physical means (e.g., heating or sputtering), resulting in strong adhesion but slower deposition rates. CVD forms coatings via chemical reactions, off
As a new polishing process, plasma polishing is a trend in stainless steel polishing. If we can make good use of plasma polishing will save us a lot of time and costs.
PVD and CVD are the most commonly used surface treatment methods for tools and moulds, CVD is based on chemical vapour deposition and PVD is based on physical vapour deposition, as they differ in principle, the final coating results are different and each has its own focus in application.
Electrolytic polishing has great advantages over traditional polishing, low cost, small footprint, can polish complex workpieces, has unmatched advantages over traditional polishing.
PVD stands for Physical Vapour Deposition. PVD coating refers to a thin film deposition technique whereby solid materials are sputtered or evaporated in a vacuum environment and deposited as pure materials or alloy components to form a coating on a substrate.
Views: 34 Author: Site Editor Publish Time: 2022-07-29 Origin: Site
1. plating metal film layer, the product to be coated into the coating chamber equipped with metal targets, open the pump vacuum and heating device for substrate heating, so that the vacuum of the substrate to 1 × 10-3Pa and reach 80-150 ℃ process temperature, the chamber into the 10-1000sccm argon gas, start sputtering power, set the sputtering power 1-15KW, coating time 10-300S, to obtain a metal film layer of thickness 1-100nm, metal film layer of copper (Cu), silver (Ag), aluminum (Al), aluminum (Al), metal film layer of color adjustable. A metal film layer with a thickness of 1-100nm is obtained, the metal film layer is copper (Cu), silver (Ag), aluminium (Al), chromium (Cr) and other metal layers, or nickel-copper (NiCu), nickel-chromium (NiCr) and other alloy layers.
2. Plating low refractive index film layer, pass the product after plating the metal film layer into the target coating chamber equipped with a low refractive index film layer that can be formed, heat it up to a process temperature of 80-150°C, pass process gas into the chamber, set the sputtering power 1-15 KW, coating time 1-300S, and obtain a low refractive index film layer with a thickness of 1-100 nm, this low refractive index film layer is silicon oxide, silicon nitride and other film layers.
3. Plating a high refractive index film layer, passing the product after plating a low refractive index film layer into a target coating chamber equipped with a target that can form a high refractive index film layer, heating to a process temperature of 80-150°C, passing a process gas into the chamber, setting sputtering power 1-15 KW, coating time 1-300S, obtaining a high refractive index film layer of thickness 1-100 nm, said high refractive index film layer being titanium oxide, titanium nitride, zirconium oxide, zirconium nitride, niobium oxide, niobium nitride, zinc oxide, indium oxide, aluminium oxide, iron oxide, chromium oxide, chromium nitride and other film layers, the process gas for this high and low refractive index film layer being at least one of Ar, N2 and O2, wherein the Ar gas flow rate is 10-1000 sccm, the N2 gas flow rate is 10-1000 sccm and the O2 gas flow rate is 10-1000 sccm.
4. Repeat steps two and three several times to obtain different coloured film layers, repeating steps two and three from 1 to 100 times.
Zirconium target + nitrogen: yellow-green with golden tones
Zirconium target + methane: dark and light black
Zirconium target + oxygen: white, transparent film
Zirconium target + nitrogen + methane: gold, imitation rose gold
Chromium target + methane: dark and light black
Chrome target + nitrogen: light black
Chromium target + nitrogen + methane: silver grey
Chromium target + oxygen: light yellow, purple, green
Stainless steel target + oxygen: purple
Stainless steel target + nitrogen: blue
Stainless steel target + methane: bright black
Silicon target + nitrogen: black
Silicon target + oxygen: cloudy white, transparent film
Silicon target + methane: yellow, green, blue, black (target purity higher than 99% can only be adjusted to black)
