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PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two major thin-film coating technologies. PVD vaporizes materials through physical means (e.g., heating or sputtering), resulting in strong adhesion but slower deposition rates. CVD forms coatings via chemical reactions, off
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PVD and CVD are the most commonly used surface treatment methods for tools and moulds, CVD is based on chemical vapour deposition and PVD is based on physical vapour deposition, as they differ in principle, the final coating results are different and each has its own focus in application.
Electrolytic polishing has great advantages over traditional polishing, low cost, small footprint, can polish complex workpieces, has unmatched advantages over traditional polishing.
PVD stands for Physical Vapour Deposition. PVD coating refers to a thin film deposition technique whereby solid materials are sputtered or evaporated in a vacuum environment and deposited as pure materials or alloy components to form a coating on a substrate.
Physical Vapor Deposition (PVD) is a technique that uses physical methods under vacuum to vaporise the surface of a material source (solid or liquid) into gaseous atoms or molecules, or partially ionised into ions, and deposits a thin film with a particular function on the surface of the substrate by a low pressure gas (or plasma) process. Physical Vapor Deposition is one of the main surface treatment techniques. PVD technology emerged at the end of the 1970s and the films prepared have the advantages of high hardness, low friction coefficient, very good wear resistance and chemical stability. The initial successful application in the field of HSS tools has caused a great deal of attention from manufacturing industries around the world, and people are developing high performance and high reliability coating equipment, while also conducting more in-depth research on coating applications in carbide and ceramic type tools.
PVD coating technology is divided into three main categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating. The main methods of physical vapour deposition are: vacuum evaporation coating, sputtering coating, arc plasma coating, ion coating and molecular beam epitaxy. Corresponding vacuum coating equipment includes vacuum evaporation coaters, vacuum sputter coaters and vacuum ion coaters.
With the advancement of deposition methods and technologies, physical vapour deposition technology can not only deposit metal and alloy films, but also compounds, ceramics, semiconductors and polymer films.
Physical vapour deposition technology has been used somewhat since the beginning of the 20th century, but has rapidly developed over the past 30 years into a new technology with broad application prospects and a trend towards environmental friendliness and cleanliness. In the watch industry, especially in the surface treatment of metal exterior parts of high-grade watches, it has reached an increasingly wide range of applications.
(1) Vaporisation of the plating material: This means that the plating material evaporates, sublimates or is sputtered, i.e. through a vaporisation source of the plating material.
(2) Migration of atoms, molecules or ions of the plating material: the supply of atoms, molecules or ions from the vapourisation source is followed by collisions, resulting in a variety of reactions.
(3) Deposition of atoms, molecules or ions of the plating materialon the substrate.
The physical vapour deposition technology is a simple process, with improved environment, no pollution, less consumables, uniform and dense film formation and strong bonding to the substrate. The technology is widely used in aerospace, electronics, optics, machinery, construction, light industry, metallurgy, materials and other fields to prepare film layers with wear resistance, corrosion resistance, decoration, electrical conductivity, insulation, photoconductivity, piezoelectricity, magnetism, lubrication, superconductivity and other properties.
With high-tech and new industrial development, physical vapour deposition technology has emerged many new advanced highlights, such as multi-arc ion plating and magnetron sputtering compatible technology, large rectangular long-arc targets and sputtering targets, non-equilibrium magnetron sputtering targets, twin target technology, strip foam multi-arc deposition winding plating technology, strip fibre fabric winding plating technology, etc., the use of complete sets of plating equipment, fully automated to the computer, large-scale industrial scale development.
